Design and use of a combined scanning tunneling microscope - atomic layer deposition system

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Abstract/Contents

Abstract
During my Ph.D. work, I designed, built, and operated a combined scanning tunneling microscope and atomic layer deposition system. A scanning tunneling microscope (STM) is a scanning probe technique that uses a sharp tip to image a surface at the atomic scale. Atomic layer deposition (ALD) is a thin-film growth technique that produces very dense films, with thickness controllable to the Angstrom scale. I will describe the design of the instrument through its two generations. I will present images from the combined instrument that track growth of individual 5 nm grains through 25 cycles of ALD over periods of up to three hours. I will show that the grain morphology shows a sensitivity to growth temperature, and will provide an interpretation of these results. The combined instrument was built for two purposes: characterizing the initial stages of ALD, and controllably growing nanoparticles by influencing ALD with the STM tip. We have achieved the former, and work remains to be done on the latter.

Description

Type of resource text
Form electronic; electronic resource; remote
Extent 1 online resource.
Publication date 2012
Issuance monographic
Language English

Creators/Contributors

Associated with Mack, James Francis
Associated with Stanford University, Department of Mechanical Engineering
Primary advisor Prinz, F. B
Thesis advisor Prinz, F. B
Thesis advisor Bent, Stacey
Thesis advisor Kenny, Thomas William
Advisor Bent, Stacey
Advisor Kenny, Thomas William

Subjects

Genre Theses

Bibliographic information

Statement of responsibility James F. Mack.
Note Submitted to the Department of Mechanical Engineering.
Thesis Thesis (Ph.D.)--Stanford University, 2012.
Location electronic resource

Access conditions

Copyright
© 2012 by James Francis Mack
License
This work is licensed under a Creative Commons Attribution Non Commercial 3.0 Unported license (CC BY-NC).

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