Investigating the use of small molecule inhibitors for area-selective atomic layer deposition

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Abstract/Contents

Abstract
Area-selective atomic layer deposition (AS-ALD) is a materials synthesis technique with the potential to support the production of featured materials with single-nanometer accuracy. Conventional AS-ALD has used pretreatment with organic self-assembled monolayers (SAMs) as a step to enable the controlled placement of a given ALD material by blocking film growth on certain areas of the substrate. However, SAM molecules are often on the length scale of many of the features being created and also can be challenging to volatilize. Research into low molecular-weight molecules that can inhibit growth while being compatible with high-volume manufacturing is therefore of interest. In line with this research is the need to understand the surface chemistry and interfacial phenomena that support the inhibitory performance of small molecule inhibitors (SMIs), with the final goal being to understand the best ways to control and prevent nucleation of ALD depending on the growth surface of interest. This thesis explores the potential of several small molecule inhibitors to support AS-ALD, and seeks to elucidate the functionalities that contribute to high-performance blocking.

Description

Type of resource text
Form electronic resource; remote; computer; online resource
Extent 1 online resource.
Place California
Place [Stanford, California]
Publisher [Stanford University]
Copyright date 2023; ©2023
Publication date 2023; 2023
Issuance monographic
Language English

Creators/Contributors

Author Yarbrough, Josiah
Degree supervisor Bent, Stacey
Thesis advisor Bent, Stacey
Thesis advisor McIntyre, Paul Cameron
Thesis advisor Tarpeh, William
Degree committee member McIntyre, Paul Cameron
Degree committee member Tarpeh, William
Associated with Stanford University, School of Engineering
Associated with Stanford University, Department of Chemical Engineering

Subjects

Genre Theses
Genre Text

Bibliographic information

Statement of responsibility Josiah Yarbrough.
Note Submitted to the Department of Chemical Engineering.
Thesis Thesis Ph.D. Stanford University 2023.
Location https://purl.stanford.edu/vz705wg1673

Access conditions

Copyright
© 2023 by Josiah Yarbrough

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