Investigating the use of small molecule inhibitors for area-selective atomic layer deposition
Abstract/Contents
- Abstract
- Area-selective atomic layer deposition (AS-ALD) is a materials synthesis technique with the potential to support the production of featured materials with single-nanometer accuracy. Conventional AS-ALD has used pretreatment with organic self-assembled monolayers (SAMs) as a step to enable the controlled placement of a given ALD material by blocking film growth on certain areas of the substrate. However, SAM molecules are often on the length scale of many of the features being created and also can be challenging to volatilize. Research into low molecular-weight molecules that can inhibit growth while being compatible with high-volume manufacturing is therefore of interest. In line with this research is the need to understand the surface chemistry and interfacial phenomena that support the inhibitory performance of small molecule inhibitors (SMIs), with the final goal being to understand the best ways to control and prevent nucleation of ALD depending on the growth surface of interest. This thesis explores the potential of several small molecule inhibitors to support AS-ALD, and seeks to elucidate the functionalities that contribute to high-performance blocking.
Description
Type of resource | text |
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Form | electronic resource; remote; computer; online resource |
Extent | 1 online resource. |
Place | California |
Place | [Stanford, California] |
Publisher | [Stanford University] |
Copyright date | 2023; ©2023 |
Publication date | 2023; 2023 |
Issuance | monographic |
Language | English |
Creators/Contributors
Author | Yarbrough, Josiah |
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Degree supervisor | Bent, Stacey |
Thesis advisor | Bent, Stacey |
Thesis advisor | McIntyre, Paul Cameron |
Thesis advisor | Tarpeh, William |
Degree committee member | McIntyre, Paul Cameron |
Degree committee member | Tarpeh, William |
Associated with | Stanford University, School of Engineering |
Associated with | Stanford University, Department of Chemical Engineering |
Subjects
Genre | Theses |
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Genre | Text |
Bibliographic information
Statement of responsibility | Josiah Yarbrough. |
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Note | Submitted to the Department of Chemical Engineering. |
Thesis | Thesis Ph.D. Stanford University 2023. |
Location | https://purl.stanford.edu/vz705wg1673 |
Access conditions
- Copyright
- © 2023 by Josiah Yarbrough
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