Influence of magnetic field on dielectric susceptibility of amorphous solids at ultra low temperature
Abstract/Contents
- Abstract
- The dielectric response of some amorphous solids below 100 mK is known to be sensitive to an applied magnetic field. This work presents new experimental data on the behavior of BK7, Aluminum-Barium-Silicate, Suprasil, Corning® microscope cover glass and Mylar® film (amorphous Polyethylene Terephthalate) samples in the temperature range from 2 mK to 100 mK in presence of a slowly varying magnetic field. We studied the dielectric constant by means of continuous wave AC capacitance measurements at 1 kHz. We observed hysteresis in the dielectric response to a magnetic field varying in a saw-like pattern with field strengths up to 2 milliTesla. The pattern of the response differs depending on the glass composition. The results presented in this work are consistent with previously made observations that nuclear spins greater than 1/2 play a crucial role in the observed magnetic field dependence.
Description
| Type of resource | text |
|---|---|
| Form | electronic; electronic resource; remote |
| Extent | 1 online resource. |
| Copyright date | 2010 |
| Publication date | 2009, c2010; 2009 |
| Issuance | monographic |
| Language | English |
Creators/Contributors
| Associated with | Polukhina, Lidiya Vladimirovna |
|---|---|
| Associated with | Stanford University, Department of Physics. |
| Primary advisor | Osheroff, Douglas D |
| Thesis advisor | Osheroff, Douglas D |
| Thesis advisor | Cabrera, Blas |
| Thesis advisor | Lipa, John A |
| Advisor | Cabrera, Blas |
| Advisor | Lipa, John A |
Subjects
| Genre | Theses |
|---|
Bibliographic information
| Statement of responsibility | Lidiya Vladimirovna Polukhina. |
|---|---|
| Note | Submitted to the Department of Physics. |
| Thesis | Thesis (Ph.D.)--Stanford University, 2010. |
| Location | electronic resource |
Access conditions
- Copyright
- © 2010 by Lidiya Vladimirovna Polukhina
- License
- This work is licensed under a Creative Commons Attribution Non Commercial 3.0 Unported license (CC BY-NC).
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