Novel materials and nanofabrication methods for the Dielectric Laser Accelerator (DLA)
Abstract/Contents
- Abstract
- Dielectric laser accelerators (DLA), laser-driven photonic structures whose evanescent fields can synchronously accelerate charged particles, have recently demonstrated acceleration gradients far exceeding those possible with conventional radio frequency (RF) sources, opening the possibility of shrinking both the size and cost of linear accelerators by orders of magnitude. The acceleration gradient of the DLA is ultimately limited by the laser-induced damage threshold (LIDT) of the constituent materials. A material with high LIDT which can be shaped precisely into sub-wavelength nano-structures is an ideal candidate for DLA. My contributions can be roughly categorized into two sections: improvements to single-stage DLA and proof-of-concept demonstrations of essential elements to realize a multi-stage implementation of DLA. My improvements to single-stage acceleration are as follows: I report the first successful DLA demonstration using novel materials with high LIDT. I present the nanofabrication methods that I have developed to shape these novel metal oxide materials (Al2O3 and Ga2O3) precisely into sub-wavelength nanostructures. I demonstrate the first successful metal oxide-based laser-driven electron acceleration in the sub-relativistic regime, with devices made of both Al2O3 and Ga2O3. I propose and simulate the performance of metal oxide-based DLA for the relativistic regime, which can achieve higher acceleration gradients when compared to current SiO2 DLA structures. Finally, I show that thin-layer coatings of these metal oxide materials act as a field reduction layer, which improves accelerator performance. My contributions to future multi-stage DLA are essential elements for a practical on-chip accelerator. I have fabricated Ga2O3-core/SiO2-clad waveguide on Si substrate and Al2O3-core/SiO2-clad waveguide on Si substrate for laser power delivery, which is crucial for future on-chip integrated DLA. I, along with Professor Peter Hommelhoff's Group, present work on realizing sustained acceleration. These include a chirped DLA grating to counteract dephasing effects, a laser-driven electron lens, and the first demonstration of a two-stage DLA. I show co-propagation-based DLA, including a ring resonator-based DLA and total internal reflection-based DLA. These results constitute an important step towards enabling an "Accelerator On A Chip.".
Description
| Type of resource | text |
|---|---|
| Form | electronic resource; remote; computer; online resource |
| Extent | 1 online resource. |
| Place | California |
| Place | [Stanford, California] |
| Publisher | [Stanford University] |
| Copyright date | 2018; ©2018 |
| Publication date | 2018; 2018 |
| Issuance | monographic |
| Language | English |
Creators/Contributors
| Author | Deng, Huiyang |
|---|---|
| Degree supervisor | Harris, J. S. (James Stewart), 1942- |
| Thesis advisor | Harris, J. S. (James Stewart), 1942- |
| Thesis advisor | Byer, R. L. (Robert L.), 1942- |
| Thesis advisor | Solgaard, Olav |
| Degree committee member | Byer, R. L. (Robert L.), 1942- |
| Degree committee member | Solgaard, Olav |
| Associated with | Stanford University, Department of Electrical Engineering. |
Subjects
| Genre | Theses |
|---|---|
| Genre | Text |
Bibliographic information
| Statement of responsibility | Huiyang Deng. |
|---|---|
| Note | Submitted to the Department of Electrical Engineering. |
| Thesis | Thesis Ph.D. Stanford University 2018. |
| Location | electronic resource |
Access conditions
- Copyright
- © 2018 by Huiyang Deng
- License
- This work is licensed under a Creative Commons Attribution Non Commercial 3.0 Unported license (CC BY-NC).
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