Heterogeneous integration by parallel insertion of chiplets into wafer

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Abstract/Contents

Abstract
The HIPPI process (Heterogeneous Integration by Palletized Parallel Insertion) embeds CMOS chiplets into MEMS wafers, to bypass the monolithic integration challenges of combining MEMS functionality with CMOS circuitry. Dry alignment is provided by passive guide tabs, which are created through polysilicon refill of front-side etched trenches. The guide tabs are compatible with further processing on the wafer. Precision chiplets are created by through-wafer etching. After chiplet drop-in, optical detection provides feedback of chiplet jamming, and horizontal driving of the chiplets finishes the zero insertion force assembly process. We demonstrate less than 2.5[mu]m of chiplet to substrate alignment error. Theoretical scaling of alignment accuracy reaches numbers comparable to photolithography, allowing high density interconnects for heterogeneous integration without precision manipulators.

Description

Type of resource text
Form electronic; electronic resource; remote
Extent 1 online resource.
Publication date 2012
Issuance monographic
Language English

Creators/Contributors

Associated with Chen, Jeng-Wen
Associated with Stanford University, Department of Electrical Engineering
Primary advisor Howe, Roger Thomas
Thesis advisor Howe, Roger Thomas
Thesis advisor Lee, Thomas
Thesis advisor Solgaard, Olav
Advisor Lee, Thomas
Advisor Solgaard, Olav

Subjects

Genre Theses

Bibliographic information

Statement of responsibility Jeng-Wen Peter Chen.
Note Submitted to the Department of Electrical Engineering.
Thesis Thesis (Ph.D.)--Stanford University, 2012.
Location electronic resource

Access conditions

Copyright
© 2012 by Jeng-Wen Chen
License
This work is licensed under a Creative Commons Attribution Non Commercial 3.0 Unported license (CC BY-NC).

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